Layer deposition techniques have emerged as indispensable methods for constructing ultrathin films with precise control over thickness, composition and microstructure. Methods such as atomic layer ...

Multiscale modelling and control of thin film deposition processes encompass advanced simulation techniques that integrate phenomena occurring over disparate spatial and temporal scales. At the ...

The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...

As chips shrink to the nanometer scale, precise control over every fabrication step becomes essential. Atomic layer deposition (ALD) has emerged as a cornerstone of nanoelectronics, enabling the ...

Product Brief Outline: Sputtering Materials, Inc. is now offering high-density casted CIG (CuInGa) targets for thin film deposition in rotatable and planar form factors for thin film solar production.

Thin films play a crucial role in the fabrication of several components and devices, such as protective coatings, integrated circuits, solar cells, and optical ...

ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...

Sumitomo Heavy Industries (SHI) has developed a new reactive plasma deposition (RPD) method to form ultra-thin tin oxide electron transport layers (ETL) for perovskite solar cells. It claims this ...

TCO layer deposition: Aluminum-doped zinc oxide (AZO) thin films have been deposited using an in-line ETP-CVD production process at Roth & Rau. ETP-CVD allows high deposition speed, reduces system ...

Dublin, Oct. 20, 2025 (GLOBE NEWSWIRE) -- The "Thin Film Semiconductor Deposition Market - Forecasts from 2025 to 2030" report has been added to ResearchAndMarkets.com's offering. The thin film ...

[Nixie] wants to sputter. We know, who doesn’t? But [Nixie] has a specific purpose for his sputtering: thin-film deposition, presumably in support of awesome science. But getting to that point ...