Sputtering targets are the source materials for the preparation of sputtered thin films. In particular, high-purity sputtering targets are used in the physical vapor deposition (PVD) process for the ...
Many applications use a manufacturing process known as thin-film sputtering deposition. The typical sputtering process uses an ion beam to impact the surface of a sputter material such as gold, silver ...
Thin films play a crucial role in the fabrication of several components and devices, such as protective coatings, integrated circuits, solar cells, and optical ...
The sputter system design allows process engineers to adjust a number of parameters to obtain desired results for variables such as grain structure, uniformity, thickness, stress, adhesion strength, ...
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Machine learning enables real-time analysis of iron oxide thin film growth in reactive magnetron sputtering
Researchers at University of Tsukuba have developed a technology for real-time estimation of the valence state and growth rate of iron oxide thin films during their formation. This novel technology ...
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